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TANAKA develops new gold bump transfer tech for delicate semiconductors, enabling smaller, more reliable electronics.
TANAKA Precious Metal Technologies has developed a new transfer method for its AuRoFUSE™ Preforms, enabling precise gold bump formation on complex or delicate semiconductor surfaces.
The process creates bumps on a silicon transfer substrate with etched openings, secures them during processing, and uses heat-induced shrinkage to release them for transfer via thermocompression bonding at 150°C and 10 MPa, followed by final bonding at 200°C and 20 MPa.
This overcomes limitations of direct bumping and photolithography on irregular or sensitive substrates, offering strong, stable, low-deformation bonds ideal for high-density integration in smartphones, LEDs, automotive electronics, and MEMS.
The technology avoids soldering short circuits and plating damage, supporting next-generation miniaturized electronics and photonics integration.
TANAKA desarrolla una nueva tecnología de transferencia de golpes de oro para semiconductores delicados, permitiendo una electrónica más pequeña y confiable.