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China builds prototype EUV lithography machine, advancing chip independence amid global restrictions.
In early 2025, Chinese researchers in Shenzhen completed a prototype extreme ultraviolet (EUV) lithography machine, a key step in producing advanced semiconductor chips, by reverse-engineering Dutch company ASML’s technology.
Built by former ASML engineers, the machine generates EUV light and operates on a factory floor but has not yet produced working chips.
The project, part of a six-year national effort led by President Xi Jinping’s advisor Ding Xuexiang and involving Huawei and state labs, aims to achieve semiconductor self-sufficiency amid U.S. and Dutch export controls.
While China still faces major technical challenges, particularly in precision components, the breakthrough suggests progress may be faster than earlier estimates of a decade-long timeline, with some experts now projecting a working chip by 2030.
China construye un prototipo de máquina de litografía EUV, avanzando en la independencia del chip en medio de restricciones globales.