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SK Hynix introduces advanced EUV tech, shrinking transistors and boosting memory production.
SK Hynix has become the first to introduce High NA EUV lithography technology for mass production at its M16 plant in South Korea.
This new system, ASML's TWINSCAN EXE:5200B, allows for transistors 1.7 times smaller and densities 2.9 times higher compared to existing EUV systems.
SK Hynix aims to simplify production processes, accelerate next-gen memory development, and strengthen its market position with this advanced technology.
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SK Hynix introduce tecnología EUV avanzada, reduciendo los transistores e impulsando la producción de memoria.